USp_6516815 (1063235), страница 5
Текст из файла (страница 5)
The apparatus of claim 42, Wherein the angled noZZles41. The apparatus of claim 33, Wherein the ?uid isdeliver the ?uid to a peripheral portion of the substrate at andelivered to upper and loWer surfaces of the substrate at anangle of incidence betWeen about 10 and about 30 degrees.42. An apparatus for etching a substrate, comprising:15an enclosure having a substrate support and a rotationactuator attached to the substrate support;an enclosure having a substrate support and a rotationactuator attached to the substrate support;a delivery assembly for delivering ?uids to a peripheraledge of a substrate disposed on the substrate support,Wherein the delivery system comprises at least one setof ?rst angled noZZles connectable to a ?rst ?uid sourceand at least one set of second angled noZZles connectable to a second ?uid source; and25a substrate lift assembly disposed in the enclosure comprising a lift platform and a plurality of arms extendingradially from the lift platform.43. The apparatus of claim 42, Wherein the at least one setof ?rst angled noZZle delivers a ?rst ?uid to an upperangle of incidence less than about 45 degrees.48.
An apparatus for etching a substrate, comprising:a delivery assembly for delivering a ?uid to a peripheraledge of a substrate disposed on the substrate support,Wherein the delivery system comprises at least oneangled noZZle disposed above an upper surface of thesubstrate and at least one angled noZZle disposed beloWa loWer surface of the substrate, Wherein the anglednoZZles deliver the ?uid to a peripheral portion of thesubstrate at an angle of incidence less than about 45degrees; anda substrate lift assembly disposed in the enclosure comprising a lift platform and a plurality of arms extendingradially from the lift platform.peripheral edge of the substrate at an angle of incidence lessthan about 45 degrees.deliver the ?uid to a peripheral edge of the substrate at an44.
The apparatus of claim 43, Wherein the at least one setof second angled noZZles delivers a second ?uid to a loWerangle of incidence betWeen about 10 and about 30 degrees.50. The apparatus of claim 48, Wherein the angled noZZlesperipheral edge of the substrate.45. An apparatus for etching a substrate, comprising:an enclosure having a substrate support and a rotationactuator attached to the substrate support;49. The apparatus of claim 48 Wherein the angled noZZles35 are each connectable to a ?rst ?uid source, a second ?uidsource, or both ?uid sources.*****.
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