USP_6576055 (1063346), страница 4
Текст из файла (страница 4)
Accordingly, the noZZles 270can direct the cleaning ?uid toWard the loWer surface 114 ofstrate overhangs the engaging portion;a conduit having an opening positioned proximate to thesupport for disposing the ?uid on the ?rst surface of themicroelectronic substrate; anda rotating barrier proximate to the support and rotatableindependently of the support at a second rate approximately equal to the ?rst rate, the barrier extending overthe ?rst surface of the microelectronic substrate to atIn one embodiment, a ?ange 237 can be connected to thedrive shaft 232 and can extend radially outWardly beneaththe substrate support 233.
The barrier 240 extends above andaround the substrate 112 and is spaced apart from the ?ange237 to de?ne an annular gap 238 betWeen the ?ange and thebarrier 240. In one embodiment, a plurality of noZZles 270a support having an engaging portion for engaging themicroelectronic substrate, the support being rotatableabout a rotation axis at a ?rst rate, the engaging portionextends upWardly and annularly around a liquid supplyembodiment, the rate at Which the barrier 240 rotates can bematched to the rate at Which the substrate 112 rotates so thatan internal air volume 260 Within the barrier 240 rotates Withapparatus comprising:65tronic substrate and extending radially outWardly from therotation axis, the barrier being spaced apart from the ?angeto de?ne a gap betWeen the ?ange and the barrier facingtoWard the second surface of the microelectronic substrate,US 6,576,055 B2109.
The apparatus of claim 1, further comprising thethe apparatus further comprising a plurality of nozzlespositioned proximate to the gap to direct a cleaning solutionrnicroelectronic substrate Wherein the rnicroelectronic subtoWard the second surface of the rnicroelectronic substrate.3. The apparatus of claim 1 Wherein the support includesa ?ange facing toWard the second surface of the rnicroelecstrate has a generally circular planforrn shape.10.
The apparatus of claim 9 Wherein the rnicroelectronicsubstrate has a diameter greater than approximately eighttronic substrate and extending radially outwardly from therotation axis, the barrier being spaced apart from the ?angeinches.11. The apparatus of claim 9 Wherein the rnicroelectronicsubstrate has a diameter of approximately tWelve inches.12. The apparatus of claim 1 Wherein the support isrotatable at up to approximately 4,000 rpm.13. The apparatus of claim 1, further comprising a sourceof rinse liquid in ?uid communication with the secondsurface of the rnicroelectronic substrate for rinsing thesecond surface.14. The apparatus of claim 13, further comprising atemperature controller coupled to the source of rinse ?uid toto de?ne a gap betWeen the ?ange and the barrier facingtoWard the second surface of the rnicroelectronic substrate,the apparatus further comprising:10a plurality of noZZles positioned proximate to the gap andcoupled to a source of cleaning solution to direct thecleaning solution toWard the second surface of thernicroelectronic substrate;a temperature controller coupled to the source of cleaningsolution to control a temperature of the cleaning solu15control a temperature of the rinse ?uid and a rate of heattransfer from the rnicroelectronic substrate.tion; and15.
The apparatus of claim 13, further comprising theliquid, the liquid having a viscosity in the range of from ?vea collection vessel positioned beneath the rnicroelectronicsubstrate to collect liquid expelled from the surfaces ofthe rnicroelectronic substrate as the rnicroelectronic2016. The apparatus of claim 13, further comprising theliquid, the liquid including a photoresist material.substrate rotates, the support and the barrier beingrotatable relative to the collection vessel.4. The apparatus of claim 1 Wherein the barrier is rernovably attached to the support and movable relative to thesupport betWeen an attached position and a detached position.5.
The apparatus of claim 1 Wherein a barrier supportextends outWardly beyond the engaging portion of thesupport.centipoise to tWenty centipoise.17. The apparatus of claim 1 Wherein a radial motion ofthe barrier is restricted relative to the barrier support by a25plurality of stanchions positioned toWard the edge of thebarrier support.18. The apparatus of claim 1 Wherein the barrier driveshaft is coupled to the ?rst rnotor by gears.19. The apparatus of claim 1 further comprising a control30arm con?gured to move the barrier upWardly and doWntion vessel extending outWardly beyond the engaging porWardly relative to the support.20. The apparatus of claim 1 further comprising an axialtion to collect ?uid dripping from the substrate.7.
The apparatus of claim 1 Wherein the barrier includesa ?rst opening for exhausting gas betWeen the barrier and thedoWnWardly relative to the support.21. The apparatus of claim 1 further comprising a control6. The apparatus of claim 1, further comprising a collecsubstrate When the substrate is engaged by the support anda second opening for introducing gas betWeen the barrierand the substrate When the substrate is engaged by theactuator con?gured to the move the barrier upWardly and35support.8.
The apparatus of claim 1 Wherein the barrier has agenerally circular cross-sectional shape When intersected bya plane generally parallel to the rnicroelectronic substrate.arm con?gured to move the barrier upWardly and doWnWardly relative to the support.22. The apparatus of claim 1 further comprising an axialactuator con?gured to the move the barrier upWardly and40doWnWardly relative to the support.*****.
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