USP_6872254 (1063349), страница 4
Текст из файла (страница 4)
4, thegap 238 betWeen the barrier 240 and the ?ange 237 cansubstrate to separate a ?rst portion of gas adjacent themicroelectronic substrate and rotating With the microelectronic substrate from a second portion of gascan be positioned in the gap 238 and can be coupled to asource of cleaning ?uid 271. Accordingly, the noZZles 270can direct the cleaning ?uid toWard the loWer surface 114 ofstrate;engaging portion relative to the vessel, the barrier beingspaced apart from and proximate to the microelectronicIn one embodiment, a ?ange 237 can be connected to thedrive shaft 232 and can extend radially outWardly beneaththe substrate support 233. The barrier 240 extends above andaround the substrate 112 and is spaced apart from the ?ange237 to de?ne an annular gap 238 betWeen the ?ange and thebarrier 240.
In one embodiment, a plurality of noZZles 270the engaging portion of the support being rotatable65microelectronic substrate, and Wherein the plurality ofnoZZles extend through the gap to direct the cleaning?uid toWard the second surface of the microelectronicsubstrate.US 6,872,254 B292. The apparatus of claim 1 wherein the retaining vesselhas a base, sidewalls extending upwardly from the base, andan upwardly facing opening for collecting ?uid from thernicroelectronic substrate.3. The apparatus of claim 1 wherein the retaining vesselis positioned beneath the support.4.
The apparatus of claim 1 wherein the retaining vesselincludes at least one port for removing ?uid collected in theretaining vessel.107. Thesubstrate8. Thesubstrateinches.9. Thesubstrateapparatus of claim 1, wherein the rnicroelectronichas a generally circular planforrn shape.apparatus of claim 7 wherein the rnicroelectronichas a diameter greater than approximately eightapparatus of claim 7 wherein the rnicroelectronichas a diameter of approximately twelve inches.10. The apparatus of claim 1, further comprising the ?uid,5. The apparatus of claim 1 wherein at least a portion of 10 the ?uid having a viscosity in the range of between ?vethe barrier is generally parallel to the surface of the substrateand has an opening for the ?uid to pass through.centipoise and twenty centipoise.11.
The apparatus of claim 1, further comprising the ?uid,6. The apparatus of claim 1 wherein the barrier is rernovthe ?uid including a photoresist rnaterial.ably attached to the support and movable relative to thesupport between an attached position and a detached posi- 15*****tion..















