Roland A. - PVD for microelectronics (779636), страница 76
Текст из файла (страница 76)
A., 350 (9.26)Kouzaki, T., 351 (9.44)Krafcsik, I., 349 (9.15)Krishna, N., 283 (8.17)Krivokapic, Z, 213 (6.23)Krolikowski, W., 349 (9.17)Krueger, G., 182 (5.17)Ku, J., 283 (8.17)Kukuta, K., 239 (7.9)Kuniya, T., 400 (11.13)Kuptsis, J. D., 49 (2.23), 283 (8.1)LLaFrance, R. L., 183 (5.50)Lai, K. E, 283 (8.8, 8.10)Lai, W. Y. C., 182 (5.19)Lamont Jr., L. T., 182 (5.27)Landis, H. S., 212 (6.1), 351 (9.45)Larsson, T., 350 (9.25)Lateef, A., 352 (9.61)Lau, S. S., 350 (9.41)Lawrence, M., 351 (9.44)Layton, J. K., 85 (3.2)Lee, J. G., 239 (7.5)Lee, S. I., 239 (7.5)Leeuwen, Van C., 183 (5.48)Leybovich, A., 400 (11.13)Lian, S., 350 (9.33)Lichtenberg, Allan J., 21 (1.18)Lieberman, Michael A., 21 (21 (1.18)Lifshitz, N., 182 (5.19)Lionette, R. W., 400 ( 11.11 )Littau, K., 351 (9.58)Littmark, U., 48 (2.9)Liu, B.
Y.-H., 183 (5.41)Liu, D., 212 (6.12, 6.13, 6.14), 349 (9.20), 350(9.36), 373 (10.14, 10.25)Logan, J. S., 85 (3.7), 283 (8.3)Lu, Q., 283 (8.8, 8.10)Luttmer, J. D., 351 (9.58)MMcCaig, L., 86 (3.22)McGeown, A., 181 (5.10)Mack, A., 240 (7.15)Mack, M.
E., 182 (5.31)McKenzie, D. R., 49 (2.25, 2.26), 373 (10.10,10.11)McLeod, R S., 182 (5.34)McVittie, J. P., 182 (5.23, 5.24), 213 (6.23)Maeda, M., 48 (2.14)Maex, K., 351 (9.43)Mahadev, V., 373 (10.26)Mahadevan, P., 85 (3.2)Marcus, M. A., 283 (8.10)Marieb, T., 240 (7.15)Marsh, R., 284 (8.24)Martin, P. J., 48 (2.4), 350 (9.23)Martin, R., 183 (5.46)Marx, D. R., 352 (9.61)405AUTHOR INDEXMasi, C.
G., 349 (9.3)Matsuda, Y., 48 (2.14)Matthews, A., 86 (3.13)Mayer, J. W., 349 (9.2, 9.15)Mayo, A. A., 212 (6.7)Mehrotra, B., 351 (9.54)Meikle, S., 212 (6.15)Metzner, C., 101 (4.16)Meveded, D. B., 85 (3.2)Mikalsen, D., 212 (6.9)Milde, F., 101 (4.15)Min, K.-H., 351 (9.52)Miura, T., 101 (4.18, 4.19)Mohammadi, F., 20 (1.3), 350 (9.40)Mondon, F., 182 (5.36)Morath, C. J., 349 (9.7, 9.8))Mori, R., 351 (9.47)Morrison, A., 351 (9.58)Moser, J., 284 (8.26), 350 (9.38)Motohiro, T., 373 (10.13)Movchan, B.
A., 349 (9.10)Mu, X-C., 240 (7.15)Mueller, J. J., 399 (11.1)Mueller, K.-H., 373 (10.23)Mueller, R. A., 49 (2.30), 86 (3.24)Mullins, W., 239 (7.2)Muraoka, K., 48 (2.14)Murarka, S. P., 359 (939)Myers, A., 350 (9.24)Naik, M., 351 (9.57)Nakajima, T., 240 (7.13)Nakamura, G., 101 (4.19)Narasimhan, M., 283 (8.17, 8.18)Nender, C., 350 (9.25, 9.28)Netterfield, R.
P., 350 (9.23)Neumann, G., 239 (7.3)Ngai, C., 350 (9.33)Nichols, C. A., 49 (2.21), 212 (6.4), 284 (8.22),351 (9.56), 373 (10.22)Nicolet, M.-A., 350 (9.41)Nomura, T., 212 (6.16)Noya, A., 351 (9.53)OOchoa, V., 240 (7.15)Oechsner, H., 48 (2.13)Ogawa, S., 351 (9.44)O'Hanlon, J. F., 181 (5.13), (5.14)Ohta, A., 351 (9.53)Okamota, A., 86 (3.23)O'Neill, T.
G., 181 (5.50)Ouellet, L., 350 (9.20)Ouyang, C., 212 (6.22)Owada, N., 182 (5.20)Owens, J., 183 (5.53)PPalmstrom, C. J., 349 (9.15)Paranjpe, A., 351 (9.58)Pargellis, A. N., 182 (5.26)Park, C. S., 239 (7.5)Park, J. H., 239 (7.5)Park, S.-E., 181 (5.9)Park, Y. H., 100 (4.8)Parsons, Robert, 20 (1.12), 100 (4.6)Paul, D., 351 (9.58)Pauleau, Y., 349 (9.13)Pavate, V., 283 (8.17)Peccoud, L., 182 (5.36)Penfold, A. S., 100 (4.2)Perera, T., 350 (9.32)Petrov, I., 284 (8.26), 350 (9.24, 9.38)Pimbley, J. M., 20 (1.4)Pindexter, D. J., 351 (9.45)Pintchovski, F., 284 (8.24)Piscevic, D., 283 (8.19)Poindexter, C., 212, (6.1)Poker, D.
B., 283 (8.9)Pol, V., 284 (8.24)Pollard, C. W., 351 (9.45)Pollard, G., 212 (6.1)Poole, J. E., 350 (9.29), 399 (11.1, 11.2), 400 (11.13)Posadowski, W. M., 351 (9.46, 9.49)Poss, G. H., 351 (9.45)Pramanik, D., 239 (7.7)Prasad, V., 212 (6.22), 373 (10.24)QQian, E, 86 (3.20), 283 (8.11, 8.14)RRaafjimakers, I.
J., 181 (5.9)Radzimski, Z. J., 351 (9.46, 9.49)AUTHOR INDEX406Ramaswami, S., 213 (6.23), 283 (8.17, 8.18,8.19)Ramkumar. K.. 349 (9.9)Reedy, D., 349 (9.16)Reschke, J., 86 (3.13). 101 (4.15)Rettner, C. T., 49 (2.22)Reynolds, G., 283 (8.8, 8.10)Rhines, W., 183 (5.52)Rhodes. R. L., 283 (8.9)Rich, P.. 240 (7.20)Richter, U., 283 (8.19)Robbie. K., 350 (9.3 1)Roberts, B., 349 (9.1)Robinson, R. S., 48 (2.10), 49 (2.24), 85 (3.1).212 (6.8), 373 (10.17)Rncke, M., 350 (9.34)Rockett, A , , 350 (9.22)Roman, B..
350 (9.33)Rosenberg. D.. 48 (2.15)Ross, C.,212 (6.1)Rossnagel. S. M., 20 (1.1 1 ). 49 (2.2 1, 2.27.2.29). 86 (3.9. 3.18. 3.21). 100 (4.5), 212(6.2. 6.3. 6.4- 6.7. 6.9). 283 (8.5, 8.6. 8.9.8.15, 8.20). 284 (8.21. 8.22, 8.23, 8.25,8.261. 349 (9.18). 351 (9.56). 372 (10.1),373 (10.16. 10.17, 10.19, 10.20, 10.22)Roth. A.. 18 1 (5.12)Rudriich, P J.. 49 (2.30).
86 (3.24Ru~ic.D. K..48 ( X ) 49, (2.21). 212 (6.4). 284(8.23). 351 (9.56). 372 (10.5. 10.6). 373( 10.22)Ryan,J.G.,212(6.1. 6.17),351 (9.45)SSacks. R.. 86 (3.22)Saenger. K. L., 86 (3.2 1 )Saigil. D.. 283 (8.17)Sainty. W. G.. 350 (9.23)Sanders. D. M.. 48 (2.3, 2.4)Saran. M.. 240 (7.23)Saraswat,K.C..20(1.3).213 (6.23)Sasaki. K., 351 (9.53)Sase. T..
35 1 (9.53)Savage. L.. 349 (9.6)Savvidese. N.. 86 (3.16)Saxena, A. N., 239 (7.7). 349 (9.9)Schiller, J. M . , 86 (3.14)Schiller, N., 86 (3.15)Schiller, S., 86 (3.15), 101 (4.15, 4.16)Schlueter, J., 349 (9.21)Schneegans, M., 283 (8.19), 350 (9.34)Schneider. J. M., 86 (3.13)Schneider, S., 101 (4.15)Scholl, R., 100 (4.1 1 )Secrest, J., 183 (5.49)Sehturaman. A. R., 240 (7.18)Seidel, T.
E., 239 (7.10)Selwyn, G. S., 183 (5.42)Sengupta, S. S.. 283 (8.18)Sequeda. F.. 183 (5.32)Serikawa, T., 86 (3.23)Sethuraman, S., 373 (10, 18)Shah, lsmat S., ed., 20 (1.13)Sheng. T.. 350 (9.31)Sheridan. T. E.. 86 (3.19)Shingubara. S.. 35 1 (9.49)Shoda, N.. 212 (6.17)Sigmund, P.. 48 (2.11)Singer. P., 182 (5.16). 183 (5.51). 5.55). 239(7.7). 240 (7.22)Sinha.
A. K.. 35 1 (9.58)Smelt. J. M.. 49 (2.25).373 (10.1 I )Smith. Donald L.. 21 ( I . 16). I(H1 (4.7)Smolinsky. G., 182 (5.19)Snly, T., 212 (6.10. 6.13, 6.14,. 239 (7.1). 240(7.17). 349 (9.20). 3.50 (9.31. 9.36. 9.37).373 (10.14, 10.15, 10.16, 10.25)Sohn.
J. H.. 239 (7.5)Solcia. C., 182 (5.18)Somekh. R . E.. 373 (10.12)Sorlie. C.. 373 (10.15)Sproul, \hl. D., 49 (2.30). 86 (3.17. 3.13. 3.24).350 (9.22)Sridharan, U. C.. 182 (5.29)Steinfelder, K.. 86 (3.14)StimmeH. 1.. 35 1 (9.541Stoner. R . J.. 349 (9.7)Stmmpfel, J..
86 (3.14)Su, D.. 340 (9.37)Succi. M., 182 (5.18jSucco. L., 400 ( 1 1.1 1 )Sugarman. A., 283 (8.3)Sundararajan. A.. 283 (8.17)Sundgren, J.-E., 350 (9.22)Suzuki, H.. 182 (5.21)AUTHOR INDEXSward. R., 212 (6.2)Vuong, T.. 350 (9.33)Taga, Y.. 373 (10.13)Tait.R.N.,212(6.10),350(9.37)Takagi. A,, 35 1 (9.47)Takeyama. M., 35 1 (9.53)Tam.
L. M.. 283 (8.10)Tampon, A,. 181 (5.8)Tanaka, Y., 182 (5.21). 283 (8.16)Taniguchi, T., 182 (5.21)Tanimoto, T., 283 (8.16)Teny,L. E.. lOO(4.1). 181 (5.1)Thompson. M., 284 (8.24)Thornton. J . A., 100 (4.2). 349 (9.1 1. 9.12). 350(9.22)Tian. F.. 350 (9.38)Ting. C. H.. 239 17.61Ting. L. M.. 240 (7.20). 35 I (9.58)Tkach. C.. 350 (9.30)Toa, L.. 239 (7.6)Togashi, M.,182 (5.21)Tokunaga.
T., I82 15.20)Tosho. Inc.. 49 (2.19)Tracy. Clarence I.. ed.. 21 ( 1.15)Tsai. W.. 212 (6.10, 6.141, 349 (9.8. 9.20). 350(9.27. 9.31, 9-36. 9 3 7 ) . 777 (10.14. 1025)T5ou. S.. 350 (9.35)Tsuchikawa. H.. 239 (7.4)Tsukada. T., 37 1 (9.48)Turene. F.. 283 (8.3)Turkot.
R.. 49 (2.21). 212 (6.4). 351 (9.56). 373(10.22)Turner. G. M.. 40 12.26). 373 (10.10)Wagner, I., 212 (6.6)Waits, Robert K., 20 (1.10), 100 (4.4)Wang, S.-Q., 239 (7. LO), 339 (9.21 ). 350 (9.38),351 (9.51)Wang. T.. 349 (9.16)Wang. Z.. 283 (8.17)Want. J.-F.. 240 (7.18)Wardly. G. A,, 183 (5.38)Watanabe, K.. 182 (5.21)Watson. L., 182 (5.17)Webber, J. C.. 49 (2.23).
283 (8.1)Wehner,G. K..48(2.5. 2.15.2.16).49(2.18)Weiss. C. A , , 183 (5.42)Westrate. S. B., 183 (5.50)Westwood. W. D.. 372 ( 10.7)Whitney. S . . 400 ( 1 1.1 1)Wickeruham, C. E.. Jr.. 350 (9.29). 399 (1 1.1.11.2).400(11.9, l l . l O , 11.11, 11.13)Wilson, R.. 349 (9.17)Wilson. R. W..100(3.1). 181 (5.2).349(9.17)Wilson. Syd R.. 21 (1.15)Windows.
B.. Xh (3. Ih)Winncri. J.. 35 1 (9.42)Winterr. H. F., 49 (2.72)Wolf. R . G.. 349 (0.7)WulfC. J.. 212 (h.1)Wolff. S.. 35 1 (9.45)Wolleru. R . A . M.. 182 (5.22)Wong. M. S.. 86 (3.13)Wright. D. R.. 182 (5.35), (5.29)UXu, Z . . 283 (8.16)Uchinn. K.. 48 (2.141Ueda. Y.. 48 (2.14)Valles-Abarca, J. A.. 373 (10.8.
10.9)van der Kolk. G. 1.. 182 (5.33)Vasudev. P K.. 239 17.10)Verkerk. M. J.. 182 (5.331Villasol, R.. 240 (7.15)Vukovic. M., 283 (8.8)Yamamura. Y.. 48 (2.14)Yamashita, M., 283 (8.13 jYanagawa. F.. 182 (5.21 )Yang. 1.. 399 ( 1 1.5)Yeh. I. T. C.. 283 (8.3)Yonaiyama. S., 101 (4.18. 4.19)Yu, J.. 240 (7.15)Yuan. J.. 283 (8.17)AUTHOR INDEX408ZZalm, P. C., 48 (2.12), 351 (9.50)Zhao, B., 239 (7.6, 7.10)Zingu, E. C., (9.15)ASubject IndexAtomic force microscopy (AFM), 288Atomic mass units (AMU), 384-85Atomic percent versus weight percent, 293Atomic techniques, 23Atomic weights, 51Auger electron spectroscopy (AES), 288, 384Auger process, 54, 55Automated guided vehicle (AGV), 114, 118Automated single-wafer, vacuum-integrated processing, 3Automobiles, 3Aviation, 3Avogadro's number of atoms, 385Advanced memory chips, 10, 376AES.
See Auger electron spectroscopyAFM. See Atomic force microscopyAGV. See Automated guided vehicleAir cooling, 379Airco Temescal, 106AI. See AluminumAluminum (AI) alloys, 1, 10, 292-307, 377advanced, 231Aluminum (AI) elevated-temperature PVD,220-31Aluminum interconnect lines, 9Aluminum plugs, 9AMAT Durasource TM, 376American Institute of Physics home page, 18American Vacuum Society, 18AMU (mass units), 51Analytic models, 353Angles, incident, 30-33Angular distribution, 34-38Angular trajectories, 241Annealing, 3Antireflection coating (ARC), 9, 10, 321-23,396Applied Materials, 113, 116ARC. See Antireflection coating (ARC)Arc-based deposition, 23Architectural glass, 95Arcing, 383, 398-99arc-supressing circuits, 83, 96, 97bipolar, 96source, 95-97unipolar, 82-83, 96Argon gas for PVD, 153-56Aspect ratio, 3, 15Back-end-of-line (BEOL) process steps, 5-6Backside water temperature, 380Backside-gas-assisted heat transfer (BSA andBSG), 146Ballistic transport of sputtered atoms, 41--42Balzers, 111, 112Barium strontium titanate, 376Batch sputtering, 107, 108Batch substrates, 105Bathtub-type cooling, 383BEOL.
![](https://s.studizba.com/z.php?f=/templates/si/i/noavatar.png&w=100&h=100&t=1"){kind=avatar}
