mass_spectrometer Pfeiffer обзор (1248468), страница 15
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Measurementspeeds of up to 10 ms/amu.– Service aids through internal spectrum simulation.The QMS 422 supports diagnosis via modem.– Measurement algorithms such as moving averages,automatic measurement range search and peak jumpingin steps to 1 amu simplify and improve the measurementdata processing.– Optimized raw data acquisition through differentoperating modes.Technical DataMeasurement speed, MIDMeasurement speed, scan analogMeasurement speed, scan BargraphMeasuring channelsOperating temperature/electronicsTemperature, storageLAN interfaceRS-232-C interfaceAnalog connectionsDigital connections, EXT PROTDigital connections, START/RUN INSYNCELM/MONScanVoltageWeightDimensions in mmQMS 422740.5 ms–60s0.5 ms/u–60s/u0.5 ms/u–60 s/u64+5 bis +40 °C–40 bis +65 °C2.5 Mbits/s, ArcNet300–19200 bits/sELM OUT/EXT IN ± 10.24 VTTLTTLTTL± 10.24 V0 ...
+10.24 V90–265 V/47–63 Hz9.8 kgModules and completion boards:free slotsModules, space requirem./max. config.IS 420HV 420HV 421AI 421DI 420DO 420Board mounted on QC: IC/AO 421145/12/13/11/11/21/3max. 1RF-generator QMH 400/410The quart stabilized radiofrequency generator supplies the requiredvoltages to the mass filter. The connection to the analyzer is establishedvia two RF cables, length 0.7 m.
The lenght of the connection cable to thecontroller is 3 m. The output of the radiofrequency generator is floating.It’s reference voltage can be regulated between 0 and –60 V relative tothe ion formation chamber.The design results in advantages such as:– ion source at positive potential. Prevents emision of electrons into theenvironment– high ion injection energy; provides short transit time of the ionsthrough fringe fieldsTechnical DataMass rangewith QMA 430with QMA 400with QMA 410RF-frequencyWeightQMH 400-1––1–128 amu2.05 MHz4.5 kgQMH 400-51–300 amu1–512 amu–2.26 MHz4.5 kgQMH 410-1–1–1024 amu–1.7 MHz6 kgQMH 410-2–1–2048 amu–1.3 MHz6 kgQMH 410-3––1–340 amu1.4 MHz6 kgPTM23067PTM23066PTM40566PTM40567PTM40568––––BG448175-TExtension cableQMH/QMS, 7 mGas analysisOrdering numberDimensions in mmQMH 400QMH 410Ion counter preamplifier CP 400Dimensions in mm3275171D-SUBSHV753.2 Gas Analysis at Pressure Range up to 10 mbarSPM Sputter Process MonitorOnline monitoring of sputter coating and reactiveprocesses.Quantitative results – data output in ppb, ppm, % or mbar.For maximum process yield and optimal product quality.Large dynamic range – simultaneous measurement from100 % to ppb range.Quality assurance through in situ monitoring of thevacuum conditions and process gases.SPM 200The picture schematically illustrates the complete analyzer flanged to a process chamber.The ion source does not penetrate into the process chamber.
A short, wide piece of tubingestablishes the connection to the process region. Due to the high conductance, the pressurein the ionization area is virtually the same as inthe process chamber. The results demonstratethat under normal operating conditions, there isno significant partial pressure difference between the process and ionization area, even forwater vapor in the 10–8 mbar range. “Normaloperating conditions” means that the ionsource is continually open toward the processchamber, also during the evacuation and conditioning phase.
Another advantage of this solution is that the filaments are arranged on thehigh vacuum side of the analyzer. The openingsfor the electron injection and the ion extractionare the main conductances between the process area nd the high vacuum of the analyzer.76SPM 400Principle constructionSPM (here SPM 400)1 Turbo pump fordifferential pumping2 Secondary electronmultiplier SEM3 Deflection unit4 Quadrupole massfilter5 Filaments6 Conductance tubeto processAny back diffusion from the analyzer chamberinto the ionization region will be negligible dueto the high conductance to the process chamber.
The SPM is operated with the softwarepackage QuadStarTM with a special SPM userinterface. This package contains routines for theprocess gases Ar, Ar+N2, Ar+N2+02 and for residual gas analysis.Both spectra clearly show that with the SPM aswell process monitoring at pressure of1 · 10-2 mbar as residual gas analysis atpressure of 5 · 10-9 mbar is possible.Gas analysisSpectrum 1:Total pressure1 · 10-2 mbar (Argon),recorded with 40 eVionization energyThe comparison of the ratios of mases 40 (Ar+)and 20 (Ar++) show the possibility to reduceformation of double loaded ions by variation ofthe ionization energy.Spectrum 2:Total pressure5 · 10-9 mbar (Argon),recorded with 70 eVionization energy773.2 Gas Analysis at Pressure Range up to 10 mbarSPM 200 with optionsScope of delivery SPM 200Scope of delivery SPM 400– Quadrupole electronics QME 200– Analyzer QMA 200 with SPM ion source and analyzerchamber– Turbomolecular-Drag pumping unit, air cooled, withTMU 071-03, TC 600, venting valve TVF 005 and diaphragm pump MVP 015-2– Pump control unit PCU 200– 19" rack unit with valve control unit and power supply24 VDC for QME and pumping unit– QuadStar™ 422 with SPM-sequences andRS-232-C-cable– Quadrupole mass spectrometer system with controlunit QMS 422, RF-generator and electrometerpreamplifier– Analyzer QMA 430 with SPM ion source and analyzerchamber– Turbomolecular-Drag pumping unit, air cooled, withTMU 071-03, TC 600, venting valve TVF 005 anddiaphragm pump MVP 015-2– Pump control unit PCU 200– 19" rack unit with valve control unit and power supply24 VDC for QME and pumping unit– QuadStar™ 422 with SPM-sequences andRS-232-C-cableOptions:– heating jacket for analyzer chamber– safety valve SVV 040 PM– Total pressure measurement equipment withSingleGauge™ TPG 261, FullRange™ gauge PKR 261and cable.– Turbocontroller DCU 001 with cable DCU/TCOptions:– safety valve SVV 040 PM– Turbocontroller DCU 001 with cable DCU/TCDimensions in mmSPM 20078SPM 400Summary SPM Sputter Process MonitorSPM 200: Economical, compact solution.SPM 400: Highest sensitivity, lowest detection limit, high measurement speed.Mass rangeDetection limit (in Argon)HydrogenWater vaporNitrogenOxygenCarbon dioxideAnalyzer with SPM ion sourceRod system, material/diameter/lengthDetectorWeight, Analyzer incl.
TurboQuadrupole control unitSoftwareConnection flangeSPM 200SPM 200SPM 400amu1–1001–2001–512ppbppbppbppbppb<3000<500<100<100<100QMA 200 Mst. steel/6/100C-SEM/Faraday13QME 200 MQuadStar™DN 40 CF<6000<500<100<100<100QMA 200 Mst. steel/6/100C-SEM/Faraday13QME 200 MQuadStar™DN 40 CF<100<500<10<10<20QMA 430st. steel/8/200SEM 217/Faraday22QMS 422QuadStar™DN 40 CFPTM26122PTM26123PTM26124PTM26125PTM26222PTM26223PTM26102PTM26104mmkgSPM for process pressure, max. 0.01 mbarWith turbomolecular pumping station, consist ofturbopump TMU 071-03, diaphragm pump MVP 015and pumping control unit PCU 200Without turbomolecular pumping station,without pumping control unit PCU 200230 V115 VOrdering numberSPM for process pressure, max.
10 mbarOrdering numberWith turbomolecular pumping station withpurge gas system for corrosive gas applications,consist of turbopump TMU 071-03,diaphragm pump MVP 015-2pumping control unit PCU 200 and CF-flangewith orifice for pressure till 10 mbarPTM26112PTM26113230 V115 VPTM26114PTM26115PTM26212PTM26213BN846384-TPTM47440BN845837-TPTM47440Gas analysisSputter process monitorStand-alone ComponentsSPMOrdering numberCathode unit for SPM ion source, yttr. IridiumPumping control unit PCU 200BN846384-TPTM47440AccessoriesSPMOrdering numberHeating for SPM chamberSVV 040 PM, safety valve, electropneum.
24 VDC(between chamber of customer and SPM)TPG 261, SingleGauge™PKR 261, FullRange™ GaugeCable, PKR-TPG, 3 mDCU 001, Display Control UnitCable, DCU-TC, 3 mPT442711PT442711PFF58231PFF58231PTG28030PTR26252PT448250-TPM041816-TPM051431-TPTG28030PTR26252PT448250-TPM041816-TPM051431-TPFF58231793.2 Gas Analysis at Pressure Range up to 10 mbarHPA 200 High Pressure AnalyzerDifferentially pumped mass spectrometer unit.For processes between 10-6 and 5 mbar.to MSGas fromthe processsystemThe valve interface consists of three valves.V1 is a bellows valve with high conductanceand nominal fitting diameter of 40 mm.
Thisvalve is opened for residual gas analysis or forleak testing under high vacuum conditions inthe process plant. In V2 and V3, orifices arebuilt-in. The conductance values are designedto cover the pressure range of 1–10-3 mbar.An orifice with a diameter of 0.03 mm is used inV2 for pressures between 1 and 5 mbar.The modules run on QuadStar™ software.Dimensions in mmHPA 20080HPI 010 manualHPI 010 electropneumaticSummary HPA High Pressure AnalyzerMass range in amu1–200Operating pressure, max.mbarDetection limit, min.mbarSensitivity for ArA/mbarAnalyzerRod system, material/diameter/lengthDetectorMass spectrometer electronicsSoftwareTurbo pumpDiaphragm pumpPumping control unitValve interface, electropneumaticwith orificeCompressed airWeight, without diaphragm pumpConnection flange1)mmmmbarkgFaradayC-SEMFaradayC-SEM51 · 10-111 · 10-143 · 10-4200QMA 200 M6/100C-SEM/FaradayQME 200 MQuadStar™TMU 071-03MVP 015-2PCU 200HPI 0100.1/0.3 1)4.5–715DN 40 CForifice 0.03 mm also part of deliveryOrdering numberPTM26710PTM26711PTM26712PTM26713Gas analysisHPA 200, 230 V, with HPI 010, elektropn.HPA 200, 115 V, with HPI 010, elektropn.HPA 200, 230 V, with HPI 010, manualHPA 200, 115 V, with HPI 010, manualStand-alone ComponentsHPA 200Ordering numberCathode unit, yttr.
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