Принципы нанометрологии (1027623), страница 70

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See angle-resolved scatterarticulated arm CMMs, 268atomic force microscope, 12, 186atomic lattice parameter,108, 109atomic resolution, 178, 181autocollimator, 13, 56, 269, 283auto-correlation function, 237auto-correlation length, 237Avogadro constant, 12, 294Avogadro method, 12Avogadro project, 294axial resolution, 17, 138, 141,156Bbackscattered electrons, 199, 200band-pass filter, 213, 216base quantities, 7batwings, 130beam waist, 129bearing length ratio, 225bearing ratio curve, 225, 226bi-directional fringe counting, 86bi-directional scatter distributionfunction, 153bifurcated sensor, 105BIPM.

See Bureau Internationaldes Poids et Mesuresbirefringent, 87Bragg angle, 109Brewster’s angle, 104BSDF. See bi-directional scatterdistribution functionbuoyancy effect, 290Bureau International des Poids etMesures, 11CCAD. See computer-aided designcantilever, 106, 191capacitive instrument, 155capacitive sensor, 99, 100capillary force, 194, 307carbon nanotube, 2, 196Cartesian coordinates, 36, 263central limit theorem, 19, 20CGPM. See Conférence Généraledes Poids et Mesureschange tree, 244, 245charge on an electron, 12chemical force microscopy, 195chemical vapour deposition, 196closed dale area, 250closed dale volume, 251closed hill area, 251closed hill volume, 251CMM. See coordinate measuringmachineCNT. See carbon nanotubeCoblentz sphere, 153coefficient of friction, 195coefficient of linear thermalexpansion, 93coefficient of thermal expansion,77coherence length, 25, 62coherence scanninginterferometer, 131, 149Combined Optical and X-rayInterferometer, 110comparator, 57, 271, 289, 295computer-aided design, 263Conférence Générale des Poids etMesures, 7confocal chromatic, 131, 138confocal curve, 135, 136, 138confocal instrument, 130, 134constraint, 36, 37, 38, 88contact mode, 179, 180, 193contrast, 61coordinate measuring machine, 4,10, 41, 263coordinate metrology, 4, 263core material volume, 241core void volume, 241correlation length, 237, 238cosine error, 82, 93course line, 244coverage factor, 21317318Indexcoverage interval, 18, 19CSI.

See coherence scanninginterferometercumulative error, 92current balance, 294cut-off length, 165, 258equivalent viscous damping, 50error, 3, 15error mapping, 269evaluation length, 213expanded uncertainty, 21, 92extreme-value parameter, 218cylindrical capacitor, 100Ddale change tree, 246, 247dale volume, 241damping, 38, 50deadpath length, 93deadweight, 12, 301degrees of freedom, 19, 20density of peaks, 250developed interfacial area ratio,239DHM. See digital holographicmicroscopedifferential plane mirrorinterferometer, 90, 91, 110diffuse reflection, 152digital hologram, 147, 148digital holographic microscope,147dimensionless quantity, 13displacement interferometry, 30,86, 92displacement sensor, 3, 85Doppler broadening, 24Doppler shift, 86, 88dynamic noise, 183EEBSD.

See electron backscattereddiffractionelastic compression, 41elastic element, 301Electrical Nanobalance, 304electromagnetic waves, 9, 59electron backscattered diffraction,200electron gun, 201electron microscope, 116electron microscopy, 199electronic balance, 296electrostatic force balance, 299elliptical polarization, 59end standard, 8, 56energy level, 23, 24engineering nanometrology, 2, 55FFabry-Pérot interferometer, 23, 25,70feature parameter, 156, 229, 235,243feedback, 28, 40FIB.

See focused ion beamfield of view, 126field parameter, 162, 235film thickness, 79filter, 26, 125, 129finesse, 71five point peak height, 250five point pit height, 250Fizeau interferometer, 66focal length, 78, 129focal shift error, 141focus variation instrument, 142focused ion beam, 178, 205F-operator, 230, 231force, 3, 12force curve, 189, 190force–distance curve, 189, 190fractal dimension, 252, 253fractal geometry, 251, 252fractal parameter, 235, 251free spectral range, 71, 91freeform component, 268frequency comb, 31frequency-stabilized laser, 23Fresnel equations, 153frictional force, 195fringe counting, 86, 89fringe fraction, 74, 80full change tree, 246full width at half maximum, 135fundamental physical constants,11FWHM.

See full width at halfmaximumGgauge block, 8, 9, 79gauge block interferometer, 81Gaussian distribution, 20, 21Gaussian filter, 215, 228Gaussian probability function,214geometric element, 267geometric error, 268Geometrical Product Specification,232, 235ghost steps, 131goniophotometer, 155GPS. See Geometrical ProductSpecificationgradient density function, 242gravitational wave detector, 48Guide to the Expression ofUncertainty in Measurement,18GUM. See Guide to the Expressionof Uncertainty in MeasurementHheight discrimination, 219Heisenberg’s UncertaintyPrinciple, 16helium ion microscope, 206helium-neon laser, 9, 10, 23heterodyne interferometer,86, 87Heydemann correction, 91, 95high-pass filter, 213hill change tree, 246homodyne interferometer, 31, 86Iinductive sensor, 100integrating sphere, 153interfacial surface roughness,152interference, 17, 62interference microscopy, 127interferometer, 13, 64interferometry, 3, 58intermittent mode, 180inter-molecular forces, 190internal resonances, 50International Organization forStandardization, 2International Prototype Kilogram,11, 290international prototype of thekilogram, 11intra-molecular forces, 193inverse areal material ratio, 239Indexiodine-stabilised He-Ne laser, 26,27ion accumulation approach,295ISO.

See InternationalOrganization forStandardizationJJamin beam-splitter, 90Jamin interferometer, 68, 69Josephson junction, 294, 295KKelvin clamp, 37, 38Kilogram, 7, 10kinematic design, 36kinematics, 36knife-edge, 106, 296knife-edge balance, 289Korea Research Institute ofStandards and Science, 300KRISS. See Korea ResearchInstitute of Standards andSciencekurtosis of the assessed profile,223kurtosis of topography heightdistribution, 236LLamb dip, 25laser, 3, 9, 23laser tracker, 56, 268Lateral Electrical Nanobalance,304lateral resolution, 16, 17, 68Lau pattern, 103law of propagation of uncertainty,19, 20lay, 15, 120length, 3, 5, 7, 55length-scale plot, 253Lennard-Jones potential, 193levitated superconductor approach,295LFB.

See low-force balanceL-filter, 229, 230line profiling, 123line standard, 8, 56linear calibration, 203linear filter, 232linear fractal complexityparameter, 253linear interpolation, 253, 255linear variable differentialtransformer, 100Linnik objective, 146low-force balance, 299low-pass filter, 129, 213LVDT.

See linear variabledifferential transformerMMach-Zehnder interferometer, 68magnification, 119, 127mass, 3, 10mass comparator, 289, 290, 295material ratio of the profile, 224material volume, 241maximum height of the profile,218maximum height of the surface,237maximum pit height of the surface,237maximum profile peak height, 218maximum profile valley depth, 218maximum surface peak height,237mean height of the profileelements, 219mean line, 214, 217mean width of the profileelements, 224measurand, 16, 18, 35mechanical comparators, 57membrane probe, 278MEMS.

Seemicroelectromechanicalsystemsmeniscus, 194, 298method of exact fractions, 75metre, 5, 7, 8metrological AFM, 188metrology loop, 43, 44Michelson interferometer, 48, 64micro- and nanotechnology, 1micro-CMM, 272micro-electro-dischargemachining, 281microelectromechanical systems,12microscope objectiv, 127, 128microsystems technology, 1miniature CMM, 263, 272Mirau objective, 145, 146MNT. See micro- andnanotechnologymodulation depth, 61moiré pattern, 103Monte Carlo method, 18, 19, 21motif, 229, 232MST. See microsystems technologymultiple scattering, 131, 132NNA. See numerical aperturenanoguitar, 305nanomaterials, 2nanoparticle, 185, 198, 204National Institute of Standardsand Technology, 7National Measurement Institute, 7National Metrology InstituteJapan, 7National Physical Laboratory, 7natural frequency, 46, 49nesting index, 230nettoyage-lavage, 291, 292newton, 12Nipkow disk, 136, 137NIST.

See National Institute ofStandards and TechnologyNMI. See National MeasurementInstituteNMIJ. See National MetrologyInstitute Japannon-contact mode, 180, 195non-cumulative error, 92non-linearity, 87, 94NPL. See National PhysicalLaboratorynumerical aperture, 17, 104, 128numerical wavefront propagationalgorithm, 149Oobjective lens, 127, 128obliquity correction, 79obliquity factor, 153optical beam deflection, 181optical cavity, 23, 24optical encoder, 102optical fibre sensor, 104optical instrument, 16, 44, 126319320Indexoptical lever sensitivity, 191optical resolution, 127, 128Ppassive vibration isolation, 49pattern recognition, 243peak extreme height, 241peak material volume, 241pendulum, 14, 49performance verification, 269permittivity, 99, 100phase change correction, 79, 81phase change on reflection, 130phase quadrature, 86, 90phase sensitive detection, 153phase-shifting interferometer, 144phase-unwrapping algorithm, 145physical quantity, 7Physikalisch-TechnischeBundesanhalt, 7pickup, 123piezoelectric scanner, 178piezoresistive cantilever, 303piezoresistive strain element, 303pinhole aperture, 134Plank’s constant, 12, 294platen, 57pneumatic gauging, 156point autofocus instrument, 139Poisson’s ratio, 42population inversion, 23power spectral density, 155precision, 3, 35primary profile, 213, 215principle of superposition, 59prismatic component, 268prismatic slideway, 38probability density function, 226probability distribution, 18probing force, 165probing system, 160, 266profile calibration artefact, 158profile element, 217, 219, 224profile height amplitude curve, 226profile peak, 217, 218profile section height difference,226profile valley, 217, 218PSI.

See phase-shiftinginterferometerPTB. See Physikalisch-TechnischeBundesanhaltQquality factor, 63, 306quantity of dimension one, 13quantum mechanical effects,11, 106Rradian, 13random error, 97random errors, 17random variable, 20Rayleigh criterion, 128reference AFM, 187reference graticule, 204reference software, 167reference surface, 66refractive index, 28, 77, 81refractometer, 77relative length parameter, 254relative material ratio, 226resolution, 15, 16resonant frequency, 49reversal methods, 281ridge line, 244ringlight, 143robust Gaussian filter, 231root mean square deviation of theassessed profile, 221root mean square gradient, 238root mean square value of theordinates, 236roughness profile, 215Ssaddle point, 244sampling length, 159, 213scale-limited surface, 229scanning electron microscope, 199scanning near-field opticalmicroscope, 179scanning probe, 2, 177scanning probe microscope, 2, 178scattering, 127, 152secondary electrons, 199segmentation, 229, 243segmentation filter, 232seismic vibration spectrum, 47seismometer, 48self-affine, 252SEM.

See scanning electronmicroscopesensitivity coefficients, 20sexagesimal, 13SF surface, 230S-filter, 229sharpness, 143shearing interferometry, 68SI. See Système Internationald’Unitésskewness of the assessed profile,222skewness of topography heightdistribution, 236skid, 125SL surface, 230smooth–rough crossover, 252SNOM. See scanning near-fieldoptical microscope.softgauge, 167software measurement standard,157, 167solid angle, 13solid-state laser, 23sound pressure attenuation, 51spacing discrimination, 219Sparrow criterion, 128specular reflection, 143speed of light, 9, 59SPM.

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