Fundamentals of Vacuum Technology (1248463)
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B5FUNDAMENTALS OFVACUUM TECHNOLOGYQuitFundamentals of Vacuum TechnologyFundamentals ofVacuum Technologyrevised and compiled byDr. Walter Umrathwith contributions fromDr. Hermann Adam , Alfred Bolz, Hermann Boy, Heinz Dohmen,Karl Gogol, Dr. Wolfgang Jorisch, Walter Mšnning,Dr. Hans-JŸrgen Mundinger, Hans-Dieter Otten, Willi Scheer,Helmut Seiger, Dr. Wolfgang Schwarz, Klaus Stepputat, Dieter Urban,Heinz-Josef Wirtzfeld, Heinz-Joachim Zenker1HomePrefacePrefaceA great deal has transpired since the final reprint of the previous edition ofFundamentals of Vacuum Technology appeared in 1987.
LEYBOLD has inthe meantime introduced a number of new developments in the field. Theseinclude the dry-running ALL×ex chemicals pump, the COOLVAC-FIRSTcryopump systems with quick regeneration feature, turbomolecular pumpswith magnetic bearings, the A-Series vacuum gauges, the TRANSPECTORand XPR mass spectrometer transmitters, leak detectors in the UL series,and the ECOTEC 500 leak detector for refrigerants and many other gases.Moreover, the present edition of the ÒFundamentalsÓ goes into much greaterdetail on some topics. Among these are residual gas analyses at lowpressures, measurement of low pressures, pressure monitoring, open- andclosed-loop pressure control, and leaks and their detection.
Included for thefirst time are the sections covering the devices used to measure and controlthe application of coatings and uses for vacuum technology in the coatingprocess. Naturally LEYBOLDÕs ÒVacuum Technology Training CenterÓ atCologne was dependent on the invaluable support of numerous associatesin collating the literature on hand and preparing new sections; I would liketo expressly thank all those individuals at this juncture.
A special word ofappreciation is due the Communications Department for its professionalcontribution in preparing this document for publishing. Regrettably Dr.Hermann Adam, who at one time compiled the very first version of theÒFundamentalsÓ, did not live to see the publication of this edition. Thoughhe had been in retirement for many years, he nonetheless labored over thecorrections and editing of this current edition until shortly before his death.I hope that this volume will enjoy a response as favorable as the previousversion.Dr.
Walter UmrathCologne, August, 19983HomeTable of Contents1.1.11.21.31.3.11.3.21.41.51.5.11.5.21.5.31.5.42.2.12.1.12.1.1.12.1.22.1.2.12.1.2.22.1.2.2.12.1.2.2.22.1.2.2.32.1.2.2.42.1.32.1.3.12.1.3.22.1.3.2.12.1.3.2.22.1.42.1.52.1.62.1.6.12.1.6.22.1.6.32.1.6.42.1.6.52.1.72.1.82.1.8.12.1.8.22.1.8.32.1.8.42.1.92.1.9.12.1.9.22.1.9.32.1.9.42.1.9.52.1.9.6Vacuum physics Quantities, their symbols,units of measure and definitions . .
. . . . . . . . . . . . . . . . . . . .9Basic terms and concepts in vacuum technology . . . . . . . . . . .9Atmospheric air . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .13Gas laws and models . . . . . . . . . . . . . . . . .
. . . . . . . . . . . . . .13Continuum theory . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .13Kinetic gas theory . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .13The pressure ranges in vacuum technology andtheir characterization . . . . . . . . . . . . . . . . . . . . . . . . . . .
. . . . 14Types of flow and conductance . . . . . . . . . . . . . . . . . . . . . . . .15Types of flow . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .15Calculating conductance values . . . . . . . . . . . . . . . . . . . . . . .16Conductance for piping and openings . . . . . . .
. . . . . . . . . . . .16Conductance values for other elements . . . . . . . . . . . . . . . . .18Vacuum Generation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .19Vacuum pumps: A survey . . . . . . . . . . . . . . . . . . . . . . . . . . . .19Oscillation displacement vacuum pumps . . . . . . .
. . . . . . . . . .20Diaphragm pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .20Liquid sealed rotary displacement pumps . . . . . . . . . . . . . . . .20Liquid ring pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .20Oil sealed rotary displacement pumps . . . . . . . . . . . . . .
. . . . .21Rotary vane pumps(TRIVAC A, TRIVAC B, TRIVAC E, SOGEVAC) . . . . . . . . . . . .21Rotary plunger pumps (E-Pumps) . . . . . . . . . . . . . . . . . . . . . .23Trochoid pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .24The gas ballast . . . . . . . . . . .
. . . . . . . . . . . . . . . . . . . . . . . . .24Dry compressing rotary displacement pumps . . . . . . . . . . . . .27Roots pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .27Claw pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .31Claw pumps with internal compression for thesemiconductor industry (ÒDRYVAC SeriesÓ) .
. . . . . . . . . . . . . .33Claw pump without internal compression for chemistryapplications (ÒALLáexÓ) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .35Accessories for oil-sealed rotary displacement pumps . . . . . . .38Condensers . . . . . . . . . . . . . . . . . . . . . . . . . .
. . . . . . . . . . . .38Fluid-entrainment pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . .40(Oil) Diffusion pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .41Oil vapor ejector pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . .43Pump fluids . . . .
. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .44Pump fluid backstreaming and its suppression(Vapor barriers, baffles) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .44Water jet pumps and steam ejectors . . . . . . . . . . . . . . . . . . . .45Turbomolecular pumps . . . . . . . . . . . . . .
. . . . . . . . . . . . . . . .46Sorption pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .50Adsorption pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .50Sublimation pumps . . . . . . . . . . . . . . . . . . . . . . . . .
. . . . . . . .51Sputter-ion pumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .51Non evaporable getter pumps (NEG pumps) . . . . . . . . . . . . . .53Cryopumps . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .54Types of cryopump . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .54The cold head and its operating principle .
. . . . . . . . . . . . . . .55The refrigerator cryopump . . . . . . . . . . . . . . . . . . . . . . . . . . . .56Bonding of gases to cold surfaces . . . . . . . . . . . . . . . . . . . . . .56Pumping speed and position of the cryopanels . . . . . . . . . . . .57Characteristic quantities of a cryopump . . . . .
. . . . . . . . . . . . .572.22.2.12.2.22.2.32.2.42.2.52.2.62.32.3.12.3.1.12.3.1.22.3.1.32.3.22.3.32.3.42.3.52.3.62.3.72.3.83.3.13.23.2.13.2.23.2.2.13.2.2.23.2.2.33.2.2.43.2.33.2.3.13.2.3.23.33.3.13.3.23.3.33.3.3.13.3.3.23.43.4.13.53.5.13.5.23.5.33.5.43.5.5Choice of pumping process . . . . . . . . .
. . . . . . . . . . . . . . . . . .60Survey of the most usual pumping processes . . . . . . . . . . . . .60Pumping of gases (dry processes) . . . . . . . . . . . . . . . . . . . . .62Pumping of gases and vapors (wet processes) . . . . . . .
. . . . .62Drying processes . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .64Production of an oil-free (hydrocarbon-free) vacuum . . . . . . . .65Ultrahigh vacuum working Techniques . . . . . . . . . . . . . . . . . .65Evacuation of a vacuum chamber and determination ofpump sizes . . . . . . . .
. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .66Evacuation of a vacuum chamber(without additional sources of gas or vapor) . . . . . . . . . . . . . .66Evacuation of a chamber in the rough vacuum region . . . . . . .67Evacuation of a chamber in the high vacuum region . . .
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