что говорить (Sputter deposition)
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Файл "что говорить" внутри архива находится в папке "Sputter deposition". Документ из архива "Sputter deposition", который расположен в категории "". Всё это находится в предмете "английский язык" из 9 семестр (1 семестр магистратуры), которые можно найти в файловом архиве МГТУ им. Н.Э.Баумана. Не смотря на прямую связь этого архива с МГТУ им. Н.Э.Баумана, его также можно найти и в других разделах. Архив можно найти в разделе "рефераты, доклады и презентации", в предмете "английский язык" в общих файлах.
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Куликовушка:
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If everyone's ready, let's start. Good afternoon everyone. It’s a pleasure to welcome you today. I am a student at the BMSTU Kulikova Ludmila. In my presentation I would like to report on Photolitography. I’ve chosen to speak about this because it’s interesting to me. It will take about 5 minutes to cover these issues
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You may already know technology. (Читаешь со слайда -Photolithography, also termed optical lithography or UV lithography, is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist", or simply "resist," on the substrate. )
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So much for point two: A single iteration of photolithography combines several steps in sequence:
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Cleaning
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Preparation
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Photoresist application
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Exposure and developing
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Etching
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Photoresist removal
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Now let's take an example, which you see here about light sources.
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Let me go over the key issues again.
Рубцовчик:
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Can we start? Let's get down to business. Hello ladies and gentlemen. Thank you all for coming. I am a student at the BMSTU Rubtsov Maxim. The theme of my talk is Sputter Deposition. I’ve chosen to speak about this because my work is closely connected with this theme. Today I’d like to give you an overview of this technology. I have limited my speech to 1 minute. I can email my presentation to anybody who wants it. I'd ask you to save your questions for the end. Please stop me if you don't understand anything I say but could you keep any specific questions until after I've finished.
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Technology of sputter deposition on the screen.
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There are a lot of types of sputter deposition:
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Ion-beam sputtering
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Reactive sputtering
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Ion-assisted deposition
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High-target-utilization sputtering
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High-power impulse magnetron sputtering (HIPIMS)
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Gas flow sputtering
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Now let's take an example of real work of sputter deposition.
Let me go over the key issues again. Structure and morphology of sputter deposition:
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The structure zone model for the description of thin film morphologies to sputter deposition. In a study on metallic layers prepared by DC sputtering, he extended the structure zone concept initially introduced by Movchan and Demchishin for evaporated films.
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Since sputter deposition belongs to the group of plasma-assisted processes, next to neutral atoms also charged species (like argon ions) hit the surface of the growing film, and this component may exert a large effect.
Well, this brings me to the end of my presentation