Принципы нанометрологии, страница 69

See phase-shiftinginterferometerPTB. See Physikalisch-TechnischeBundesanhaltQquality factor, 63, 306quantity of dimension one, 13quantum mechanical effects,11, 106Rradian, 13random error, 97random errors, 17random variable, 20Rayleigh criterion, 128reference AFM, 187reference graticule, 204reference software, 167reference surface, 66refractive index, 28, 77, 81refractometer, 77relative length parameter, 254relative material ratio, 226resolution, 15, 16resonant frequency, 49reversal methods, 281ridge line, 244ringlight, 143robust Gaussian filter, 231root mean square deviation of theassessed profile, 221root mean square gradient, 238root mean square value of theordinates, 236roughness profile, 215Ssaddle point, 244sampling length, 159, 213scale-limited surface, 229scanning electron microscope, 199scanning near-field opticalmicroscope, 179scanning probe, 2, 177scanning probe microscope, 2, 178scattering, 127, 152secondary electrons, 199segmentation, 229, 243segmentation filter, 232seismic vibration spectrum, 47seismometer, 48self-affine, 252SEM.

See scanning electronmicroscopesensitivity coefficients, 20sexagesimal, 13SF surface, 230S-filter, 229sharpness, 143shearing interferometry, 68SI. See Système Internationald’Unitésskewness of the assessed profile,222skewness of topography heightdistribution, 236skid, 125SL surface, 230smooth–rough crossover, 252SNOM.

See scanning near-fieldoptical microscope.softgauge, 167software measurement standard,157, 167solid angle, 13solid-state laser, 23sound pressure attenuation, 51spacing discrimination, 219Sparrow criterion, 128specular reflection, 143speed of light, 9, 59SPM. See scanning probemicroscopespot size, 129, 141spring constant, 13, 191standard deviation, 19standard uncertainty, 12, 19static noise, 183steradian, 13stiffness, 36, 39stimulated emission, 24stitching, 132STM. See scanning tunnellingmicroscopestratified functional properties,228stray capacitance, 100stray reflection, 97structural loop, 43structured light projection, 134stylus force, 124stylus instrument, 14, 123stylus qualification, 263stylus tip, 124, 125substitute element, 264surface damage, 124, 278surface datum, 125Indexsurface form, 115surface integrity, 115surface profile, 10, 120, 212surface texture, 2, 117, 121surface texture parameters, 121surface topography, 35, 115swept-frequency interferometry, 91symmetry, 39, 46systematic errors, 17, 98Système International d’Unités, 6Ttapping mode, 180t-distribution, 20, 21TEM.

See transmission electronmicroscopeten point height, 250texture aspect ratio, 238texture direction, 242thermal conductivity, 45thermal diffusivity, 45thermal distortion, 45thermal expansion, 45, 77, 92thermal expansion coefficient, 43thermal loop, 43thermal mass, 45TIS. See total integrated scattertotal height of the surface, 219total integrated scatter, 153total internal reflectance, 104total profile, 212total traverse length, 213touch trigger probe, 266traceability, 7, 14traced profile, 212transmissibility, 49transmission characteristic, 51,214transmission electron microscope,201triangulation instrument, 132true value, 15tunnelling effect, 179two-pan balance, 296Twyman-Green interferometer, 64type A evaluation, 19type B evaluation, 19visibility, 61vision system, 266void volume, 241volumetric error compensation,269Wuncertainty, 3, 15, 17unified co-ordinate system, 234unit, 2Watt balance, 11, 294wavelength at 50% depthmodulation, 129waviness profile, 213, 216weight, 10weighting function, 214Welch-Satterthwaite formula,20white light interference, 62white light scanninginterferometry, 149Wolf pruning, 244work function, 180wringing, 56, 57VXUVan der Waals force, 194vertical scanning white lightinterferometry, 149vibrating probe, 279vibration isolation system, 49VIM, 15virtual CMM, 271viscous damping, 49X-ray interferometer, 108YYoung’s modulus, 42, 192ZZeeman-stabilised laser, 28321This page intentionally left blank.